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Glow discharge processes : sputtering and plasma etching
Material type:
TextLanguage: English Publication details: New York : John Wiley & Sons, 1980.Description: 406pISBN: - 9780471078289
- 537.52Â N80 CHA
| Item type | Current library | Collection | Call number | Status | Barcode | |
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Reference Books
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Nalanda Library Reference | Reference | 537.52 N80 CHA (Browse shelf(Opens below)) | Available | 9673 |
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| 537 T10 KRA.F Electromagnetics with applications | 537 T10 KRA.F Electromagnetics with applications | 537.01515 T05 CIA Handbook of numerical analysis, | 537.52 N80 CHA Glow discharge processes : sputtering and plasma etching | 537.6 N99 GRI Introduction to electrodynamics | 537.6 N99 GRI Introduction to electrodynamics | 537.6 T10 JAC Classical electrodynamics |
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